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Metrology of Advanced Optics

15th June 2009 - 17th June 2009
International Congress Centre Munich, Germany

Metrology of Advanced Optics

This is a sub-conference of Manufacturing of Optical Components to be held under the umbrella of the WORLD OF PHOTONICS CONGRESS 2009, from 15 - 17 June, 2009. It will be organized as a joint session with the SPIE Conference “Optical Measurement Systems for Industrial Inspection VI”.

In co-operation with:

 

Topics include, but are not limited to:

  • Inventions, breakthroughs and clever ideas for optical testing
  • Advanced interferometric systems and techniques
  • Slope and curvature methods
  • The role of refractive and diffractive compensators
  • Homogeneity testing
  • Wavefront analysis
  • Systematic error compensation
  • High precision in difficult environments, including vibration and air turbulence
  • Mid-spatial frequency measurements and analyses
  • Metrology of micro-optics
  • Metrology for aspheric and freeform optical surfaces
  • Metrology for micro-structured surfaces for optical element fabrication
  • Metrology of very large mirrors
  • Metrology for EUV and immersion lithography lenses and mirrors
  • Quality specifications, including new standards and methods
  • Uncertainty analysis, calibration and traceability
  • In-process/in-machine measurement for improved optics production

Chairs

  • Peter de Groot, Zygo Corporation (US)
  • Christof Pruss, Universität Stuttgart (DE) 

Abstract Submission and Deadlines

  • Submission will open in December 2008 
  • Deadline for submission of abstracts: 26 January 2009
  • Notification to authors: 19 February 2009
  • Publication of the programme: April 2009

Prospective authors are requested to submit an abstract covering a minimum of half a page and a maximum of two pages. All accepted abstracts will be published in the EOS Conference digest that will be available on-site at the beginning of the conference.  Abstracts shall be submitted online at www.myeos.org/MUNICH2009 with the responsible author’s contact data. The EOS guidelines for abstracts can be downloaded at www.myeos.org/abstractguidelines. Submission will open at a later date.

JEOS:RP - Special Publication Offer

The authors of accepted abstracts receive a 20% discount on the publication rate for JEOS:RP, the e-journal of the European Optical Society (www.jeos.org). The paper submitted to JEOS:RP must be an original contribution that is connected to the conference presentation and must be submitted no later than 15 August, 2009. The publication rate for authors of the event is 280€ (instead of 350€).

Registration

The registration for this EOS conference includes admission to all conferences of the WORLD OF PHOTONICS CONGRESS 2009 as well as to the LASER World of PHOTONICS 2009 exhibition. Please register via the EOS online shop at www.myeos.org/shop. Deadline for early-bird registration: 4 May 2009.

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Contact

European Optical Society (EOS)
Judith Herzog
Event & Account Management
Hollerithallee 8
30419 Hannover, Germany

Phone: +49-511-2788-159
Fax: +49-511-2788-119

E-mail: munich@myeos.org
URL: www.myeos.org/MUNICH2009

Sub-Conferences